@Article{SouzaGoRiDiUeSc:2017:PhChEf,
author = "Souza, Gelson B. and Gonsalves, Silvio H. and Ribeiro, Karen C.
and Ditzel, Dair G. and Ueda, M{\'a}rio and Schreiner, Wido H.",
affiliation = "{Universidade Estadual de Ponta Grossa (UEPG)} and {Universidade
Estadual de Ponta Grossa (UEPG)} and {Universidade Estadual de
Ponta Grossa (UEPG)} and {Universidade Estadual de Ponta Grossa
(UEPG)} and {Instituto Nacional de Pesquisas Espaciais (INPE)} and
{Universidade Federal do Paran{\'a} (UFPR)}",
title = "Physical and chemical effects of the hydrogen irradiation on
nitrided titanium surfaces",
journal = "Surface and Coatings Technology",
year = "2017",
volume = "312",
pages = "91--100",
month = "Feb.",
keywords = "Denitriding, Hydrogen, Plasma immersion ion implantation, Plasma
nitriding, Titanium.",
abstract = "Many applications aiming the use of titanium and titanium-based
materials involve the surface interaction with protons or hydrogen
isotopes, such as in chemical and nuclear power plants, marine and
aerospace environments. Because of the high affinity of titanium
for hydrogen and the consequent deleterious effects, the study of
surface interactions contributes to the understanding of the
protection mechanisms, such as the H-diffusion barrier provided by
nitriding, as well as the fine surface tailoring achieved by
hydrogenation. Nitrided titanium surfaces were produced via plasma
nitriding (PN), carried out at 400 °C and 600 °C. Afterwards,
titanium and nitrided titanium were submitted to the hydrogen
plasma immersion ion implantation (H-PIII), using ion energies
from 1.2 to 5.0 keV. The hydrogen modifications imposed were
restricted to the nanometer depth range, causing no significant
variations in hardness and elastic modulus (measured in depths
larger than 70 nm) or in the crystalline structure, as inferred
from nanoindentantion and grazing incidence X-ray diffraction,
respectively. From the X-ray photoelectron and micro-Raman
spectroscopies, the hydrogen irradiation was found to cause
denitriding on the nitrided titanium, changing the TiN
stoichiometry as a consequence of conjoined physical and chemical
effects on the surface atoms. The atomic N/Ti ratio changed from
0.9 (not hydrogenated) to 0.6 (5 keV) up to ~ 2 nm depth. The Ti/N
decrement and the resulting TiO2 surface layer growth followed
approximately linear correlations with the implantation energies.
Additional investigations with Fourier-transform infrared
spectroscopy disclosed vibrational bands featured by a strong line
at 668 cm\− 1 (possibly OTi(OH)2) in samples submitted
independently to PN and H-PIII, suggesting that different
mechanisms of hydroxyl absorption on titanium took place on those
surfaces.",
doi = "10.1016/j.surfcoat.2016.10.005",
url = "http://dx.doi.org/10.1016/j.surfcoat.2016.10.005",
issn = "0257-8972",
language = "en",
targetfile = "souza_physical.pdf",
urlaccessdate = "30 abr. 2024"
}